Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device

ABSTRACT

A patterned substrate has a laminated pattern having laminating patterns formed by drying droplets containing a pattern formation material. A lower layer pattern contains a surfactant that is lyophilic with respect to droplets that form an upper layer pattern.

BACKGROUND

1. Technical Field

The invention relates to a patterned substrate, an electro-opticaldevice, and a method for manufacturing an electro-optical device.

2. Related Art

Known displays equipped with light emitting elements include organicelectroluminescence displays (organic EL displays) used as anelectro-optical device equipped with an organic electroluminescenceelement (organic EL element).

Methods for manufacturing organic EL elements are generally classifiedby the kind of material that makes up its organic EL layer thereof. Whenthe material that makes up the organic EL layer is a low-molecularweight organic material, a vapor phase process is utilized, in which theorganic EL layer is formed by the vapor deposition of this low-molecularweight organic material. On the other hand, when the material that makesup the organic EL layer is a high-molecular weight organic material, aliquid phase process is utilized, in which the high-molecular weightorganic material is dissolved in an organic solvent or the like, and acoating of this solution is applied and dried.

With an inkjet method, which is a type of liquid phase process, tinydroplets of solution are discharged, so the location where the organicEL layer is formed, the film thickness, and the like can be controlledmore precisely than with other liquid phase processes (such as spincoating). Furthermore, since an inkjet method involves discharging thedroplets only in the region where the organic EL layer is to be formed(the element formation region), the high-molecular weight organicmaterial (the raw material) can be used in a smaller amount.

With an inkjet method, however, as the contact angle of the dropletsincreases with respect to the element formation region (that is, aswettability decreases), the discharged droplets end up clumping in justone part of the pattern formation region. As a result, depending on theboundary between droplets and other factors, this can lead to problemssuch as a loss of uniformity of shape (such as the film thicknessuniformity of the organic EL layer, or the film thickness uniformitybetween organic EL layers).

In view of this, it has been proposed in the past that the wettabilityof the discharged droplets be improved in an inkjet method (seeJP-A-2002-334782, for example). In JP-A-2002-334782, the patternformation region (over the transparent electrode) is subjected to alyophilic plasma treatment (oxygen plasma treatment) before the dropletsare discharged. This improves the wettability of the droplets andincreases the uniformity of the pattern shape within the patternformation region.

In general, an organic EL layer is formed from a laminated patternhaving at least a light emitting layer that emits colored light and ahole transport layer formed between this light emitting layer and ananode (such as an ITO film). When a laminated pattern such as this isformed, with an inkjet method, the upper layer pattern and the lowerlayer pattern are made of materials with different polarity in order toprevent the lower layer pattern from dissolving into the droplets thatform the upper layer pattern. For example, the upper layer pattern isformed by dissolving or dispersing a lipophilic light emitting materialin an aromatic organic solvent, and the lower layer pattern is formed bydissolving or dispersing a hydrophilic hole transport layer in water.

In other words, a material with low wettability with respect to thelower layer pattern is selected for the material that forms the upperlayer pattern. Accordingly, the lower layer pattern has to be subjectedto the above-mentioned lyophilic plasma treatment in order to ensure thewettability of the droplets that form the upper layer pattern.

However, since the lower layer pattern (such as a hole transport layer)is formed from an organic substance with low plasma resistance, aproblem is that subjecting this lower layer pattern to a plasmatreatment or the like can damage the lower layer pattern. Anotherproblem is that tacking on this plasma treatment step results incorrespondingly lower productivity of the organic EL display.

SUMMARY

It is an advantage of the invention to provide a patterned substrate, anelectro-optical device, and a method for manufacturing anelectro-optical device, with which the uniformity of a laminated patternformed by drying droplets is increased, and the productivity thereof isimproved.

The patterned substrate of an aspect of the invention includes alaminated pattern formed by laminating patterns formed by dryingdroplets containing a pattern formation material, wherein the lowerlayer pattern contains a surfactant that is lyophilic with respect tothe droplets that form the upper layer pattern.

With the patterned substrate of the invention, the surfactant containedin the lower layer pattern improves the wettability of the dropletsforming the upper layer pattern with respect to the lower layer pattern.Therefore, an upper layer pattern of uniform shape can be laminated overthe lower layer pattern without having to add any surface treatment stepor the like. This in turn allows the productivity of the patternedsubstrate to be increased.

It is preferable that the surfactant in this patterned substrate includea functional group that is lyophilic with respect to the droplets thatform the upper layer pattern, and a functional group that is lyophilicwith respect to the droplets that form the lower layer pattern.

With this patterned substrate, since the surfactant includes afunctional group that is lyophilic with respect to the droplets thatform the lower layer pattern, this surfactant can be uniformly mixedinto the droplets that form the lower layer pattern. Also, since thesurfactant has a functional group that is lyophilic with respect to thedroplets that form the upper layer pattern, this surfactant is capableof improving the wettability of the droplets that form the upper layerpattern. Therefore, the upper layer pattern can be laminated in auniform shape over the lower layer pattern, and the productivity of thepatterned substrate can be increased.

It is preferable that the surfactant in this patterned substrate be anorganic compound including a hydrophilic functional group and alipophilic functional group. For example, a hydrolyzate of silanecoupling agent having a functional group that is lyophilic to thedroplets that form the upper layer pattern can be utilized.

It is preferable that the pattern formation material in this patternedsubstrate be a light emitting element formation material, and thelaminated pattern is a light emitting element.

With this patterned substrate, a light emitting element can be formed ina uniform shape, and the productivity of a patterned substrate equippedwith this light emitting element can be increased.

The electro-optical device of another aspect of the invention isequipped with a light emitting element formed by laminating thin filmlayers formed by drying droplets containing a thin film layer formationmaterial, wherein the lower thin film layer contains a surfactant thatis lyophilic with respect to the droplets that form the upper thin filmlayer.

With the electro-optical device of this aspect of the invention, thesurfactant contained in the lower thin film layer can improve thewettability of the droplets that form the upper thin film layer withrespect to the lower thin film layer. Therefore, an upper thin filmlayer having a more uniform shape can be laminated over the lower thinfilm layer without having to add any surface treatment step. This inturn allows the productivity of the electro-optical device to beincreased.

It is preferable that the surfactant in this electro-optical deviceinclude a functional group that is lyophilic with respect to thedroplets that form the upper thin film layer, and a functional groupthat is lyophilic with respect to the droplets that form the lower thinfilm layer.

With this electro-optical device, because the surfactant includes afunctional group that is lyophilic with respect to the droplets thatform the lower thin film layer, this surfactant can be more uniformlymixed into the droplets that form the lower thin film layer. Also, sincethe surfactant includes a functional group that is lyophilic withrespect to the droplets that form the upper thin film layer, thissurfactant can be more uniformly mixed into the droplets that form theupper thin film layer. Therefore, an upper thin film layer having a moreuniform shape can be laminated over the lower thin film layer, and theproductivity of the electro-optical device can be increased.

It is preferable that the surfactant in this electro-optical device bean organic compound including a hydrophilic functional group and alipophilic functional group. For example, a hydrolyzate of silanecoupling agent having a functional group that is lyophilic to thedroplets that form the upper layer can be utilized.

It is preferable that the light emitting element in this electro-opticaldevice be an electroluminescence element produced by laminating the thinfilm layers between a transparent electrode and a back electrode.

With this electro-optical device, the productivity of an electro-opticaldevice equipped with an electroluminescence element can be increased.

It is preferable that the light emitting element in this electro-opticaldevice be an organic electroluminescence element including theabove-mentioned thin film layers composed of an organic material.

With this electro-optical device, the productivity of an electro-opticaldevice equipped with an organic electroluminescence element can beincreased.

It is preferable that the upper thin film layer in this electro-opticaldevice be a light emitting layer composed of a light emitting layerformation material that can be dissolved or dispersed in a hydrophobicliquid, and that the lower thin film layer be a hole transport layercomposed of a hole transport layer formation material that can bedissolved or dispersed in a hydrophilic liquid.

With this electro-optical device, because a hole transport layer thatcan be dissolved or dispersed in a hydrophilic liquid contains asurfactant, a light emitting layer that can be dissolved or dispersed ina hydrophobic liquid can be more uniformly laminated over this holetransport layer.

The method for manufacturing an electro-optical device of still anotheraspect of the invention is a method in which thin film layers are formedby drying droplets containing a thin film layer formation material, andthese thin film layers are laminated to form a light emitting element.The method includes mixing a surfactant that is lyophilic with respectthe droplets that form an upper thin film layer into droplets that formthe lower thin film layer; and drying the droplets in which thissurfactant has been mixed to form the lower thin film layer, and thendrying the droplets that form the upper thin film layer on the lowerthin film layer to laminate the upper thin film layer over the lowerthin film layer.

With the method for manufacturing an electro-optical device of theinvention, the surfactant mixed into the droplets that form the lowerthin film layer improves the wettability of the droplets that form theupper thin film layer with respect to the lower thin film layer.Therefore, an upper thin film layer of uniform shape can be laminatedover the lower thin film layer without having to add any surfacetreatment step. This in turn allows the productivity of theelectro-optical device to be increased.

It is preferable that the surfactant in this method for manufacturing anelectro-optical device include a functional group that is lyophilic withrespect to the droplets that form the upper layer pattern, and afunctional group that is lyophilic with respect to the droplets thatform the lower layer pattern.

With this method for manufacturing an electro-optical device, becausethe surfactant includes a functional group that is lyophilic withrespect to the droplets that form the lower thin film layer, thissurfactant can be more uniformly mixed into the droplets that form thelower thin film layer. Also, since the surfactant includes a functionalgroup that is lyophilic with respect to the droplets that form the upperthin film layer, this surfactant can be more uniformly mixed into thedroplets that form the upper thin film layer. Therefore, an upper thinfilm layer of uniform shape can be laminated over the lower thin filmlayer, and the productivity of the electro-optical device can beincreased.

It is preferable that the surfactant in this method for manufacturing anelectro-optical device be an organic compound including a hydrophilicfunctional group and a lipophilic functional group. For example, asilane coupling agent having a functional group that is lyophilic to thedroplets that form the upper layer pattern can be utilized.

It is preferable that the light emitting element in this method formanufacturing an electro-optical device be an electroluminescenceelement produced by laminating the thin film layers between atransparent electrode and a back electrode.

With this method for manufacturing an electro-optical device, theproductivity of an electro-optical device equipped with anelectroluminescence element can be increased.

It is preferable that the light emitting element in this method formanufacturing an electro-optical device is an organicelectroluminescence element having the above-mentioned thin film layerscomposed of an organic material.

With this method for manufacturing an electro-optical device, theproductivity of an electro-optical device equipped with an organicelectroluminescence element can be increased.

In this method for manufacturing an electro-optical device, it ispreferable that the surfactant be mixed into a hydrophilic liquidcontaining a hole transport layer formation material, and the dropletsof the liquid in which the surfactant has been mixed are dried to form ahole transport layer that is the lower layer, after which a hydrophobicliquid containing a light emitting layer formation material is driedover the hole transport layer to laminate a light emitting layer that isthe upper layer.

With this method for manufacturing an electro-optical device, becausethe hole transport layer contains a surfactant, a water-repellant liquidcontaining a light emitting layer formation material can wet and spreadout over a hole transport layer formed by drying hydrophilic droplets,and a light emitting layer can be laminated uniformly. Therefore, theproductivity of an electro-optical device equipped with an organicelectroluminescence element composed of a hole transport layer and alight emitting layer can be increased.

In this method for manufacturing an electro-optical device, it ispreferable that the main component of the above-mentioned hydrophilicliquid be a polar liquid, and that the main component of theabove-mentioned hydrophobic liquid be a non-polar liquid.

With this method for manufacturing an electro-optical device, a lightemitting layer formed by drying a non-polar liquid can be uniformlylaminated over a hole transport layer formed by drying a polar liquid.

In this method for manufacturing an electro-optical device, it ispreferable that the droplets be discharged from a droplet dischargeapparatus.

With this method for manufacturing an electro-optical device, becausefine droplets are formed by a droplet discharge apparatus, a lightemitting element can be formed in a more uniform shape, and theproductivity of an electro-optical device can be increased.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a simplified plan view of an organic EL display that is anembodiment of the invention;

FIG. 2 is a simplified plan view of pixels in the same;

FIG. 3 is a simplified cross section of the control element formationregion in the same;

FIG. 4 is a simplified cross section of the control element formationregion in the same;

FIG. 5 is a simplified cross section of the light emitting elementformation region in the same;

FIG. 6 is a flowchart of the steps of manufacturing an electro-opticaldevice;

FIG. 7 is a diagram illustrating the steps of manufacturing anelectro-optical device;

FIG. 8 is a diagram illustrating the steps of manufacturing anelectro-optical device;

FIG. 9 is a diagram illustrating the steps of manufacturing anelectro-optical device; and

FIG. 10 is a diagram illustrating the steps of manufacturing anelectro-optical device.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

Specific embodiments of the invention will now be described throughreference to FIGS. 1 to 10. FIG. 1 is a simplified plan view of anorganic electroluminescence display (organic EL display) that serves asan electro-optical device.

As shown in FIG. 1, an organic EL display 10 is equipped with atransparent substrate 11 as a patterned substrate. The transparentsubstrate 11 is a non-alkaline glass substrate formed in the shape of asquare, and a square element formation region 12 is formed on thesurface thereof (element formation surface 11 a). In this elementformation region 12, a plurality of data lines Ly are formed at aspecific spacing and extending in the vertical direction (columndirection). The data lines Ly are electrically connected to a data linedrive circuit Dr1 disposed on the lower side of the transparentsubstrate 11. The data line drive circuit Dr1 produces a data signal onthe basis of display data supplied from an external apparatus (notshown), and outputs this data signal at a specific timing to the datalines Ly corresponding to the data signal.

In the element formation region 12, a plurality of power lines Lvextending in the column direction are provided to the data lines Ly at aspecific spacing. The power lines Lv are electrically connected to acommon power line Lvc formed on the lower side of the element formationregion 12, and drive power produced by a power supply voltage productioncircuit (not shown) is supplied to the power lines Lv.

A plurality of scanning lines Lx extending in the directionperpendicular to the data lines Ly and the power lines Lv (the rowdirection) are formed at a specific spacing in the element formationregion 12. The scanning lines Lx are electrically connected to ascanning line drive circuit Dr2 formed on the left side of thetransparent substrate 11. The scanning line drive circuit Dr2selectively drives specific scanning lines Lx from among the pluralityof scanning lines Lx at a specific timing on the basis of a scanningcontrol signal supplied from a control circuit (not shown), and ascanning signal is outputted to the scanning lines Lx.

A plurality of pixels 13 arranged in a matrix are formed by connectingto the corresponding data lines Ly, power lines Lv, and scanning linesLx where the data lines Ly and the scanning lines Lx intersect. Acontrol element formation region 14 and a light emitting elementformation region 15 are delineated within each of the pixels 13. Thepixels 13 are protected by covering the top side of the elementformation region 12 with a square sealing substrate 16 (the two-dotchain line in FIG. 1).

The pixels 13 in this embodiment are pixels that emit light ofcorresponding colors, and are either red pixels that emit red light, orgreen pixels that emit green light, or blue pixels that emit blue light.These pixels 13 are used to display a full-color image on the back side(display side 11 b) of the transparent substrate 11.

The pixels 13 will now be described. FIG. 2 is a simplified plan view ofthe layout of the control element formation region 14 and the lightemitting element formation region 15. FIGS. 3 and 4 are simplified crosssections of the control element formation region 14 along the one-dotchain lines A-A and B-B, respectively, in FIG. 2. FIG. 5 is a simplifiedcross section of the light emitting element formation region 15 alongthe one-dot chain line C-C in FIG. 2.

First the structure of the control element formation regions 14 will bedescribed. As shown in FIG. 2, a control element formation region 14 isformed on the lower side of each of the pixels 13, and a firsttransistor (switching transistor) T1, a second transistor (drivetransistor) T2, and a holding capacitor Cs are formed in each controlelement formation region 14.

As shown in FIG. 3, the switching transistor T1 is equipped with a firstchannel film B1 at its lowermost layer. The first channel film B1 is ap-type polysilicon film formed in the shape of an island on the elementformation surface 11 a, in the middle of which is formed a first channelregion C1. Activated n-type regions (a first source region S1 and afirst drain region D1) are formed flanking the first channel region C1on the left and right sides. In other words, the switching transistor T1is what is known as a polysilicon TFT.

A gate insulation film Gox and a first gate electrode G1 are formed onthe upper side of the first channel region C1, in that order from theelement formation surface 11 a. The gate insulation film Gox is asilicon oxide film or other such insulating film having opticaltransmissivity, and is deposited over substantially the entire surfaceof the element formation surface 11 a and the upper side of the firstchannel region C1. The first gate electrode G1 is a tantalum, aluminum,or other such low-resistance metal film, formed across from the firstchannel region C1, and is electrically connected to a scanning line Lxas shown in FIG. 2. As shown in FIG. 3, the first gate electrode G1 iselectrically insulated by a first interlayer insulation film IL1deposited on the upper side of the gate insulation film Gox.

When the scanning line drive circuit Dr2 inputs a scanning signalthrough the scanning line Lx to the first gate electrode G1, theswitching transistor T1 is switched on by this scanning signal.

A data line Ly that goes through the first interlayer insulation filmIL1 and the gate insulation film Gox is electrically connected to thefirst source region S1. A first drain electrode Dp1 that goes throughthe first interlayer insulation film IL1 and the gate insulation filmGox is electrically connected to the first drain region D1. As shown inFIG. 3, this data line Ly and first drain electrode Dp1 are electricallyconnected by a second interlayer insulation film IL2 deposited on theupper side of the first interlayer insulation film IL1.

The scanning line drive circuit Dr2 then successively selects thescanning lines Lx one at a time on the basis of line-order scanning,whereupon the switching transistor T1 of the pixel 13 is switched on inits turn and while selected. When the switching transistor T1 isswitched on, the data signal outputted from the data line drive circuitDr1 is outputted through the data line Ly and the switching transistorT1 (channel film B1) to the first drain electrode Dp1.

As shown in FIG. 4, the drive transistor T2 is a polysilicon TFTequipped with a second channel region C2, a second source region S2, anda second drain region D2. A second gate electrode G2 is formed via thegate insulation film Gox on the upper side of a second channel film B2thereof. The second gate electrode G2 is a tantalum, aluminum, or othersuch low-resistance metal film, and as shown in FIG. 2, is electricallyconnected to a lower electrode Cp1 of the holding capacitor Cs and thefirst drain electrode Dp1 of the switching transistor T1. As shown inFIG. 4, the second gate electrode G2 and the lower electrode Cp1 areelectrically connected by the first interlayer insulation film IL1deposited on the upper side of the gate insulation film Gox.

The second source region S2 is electrically connected to an upperelectrode Cp2 of the holding capacitor Cs that goes through the firstinterlayer insulation film IL1. As shown in FIG. 2, this upper electrodeCp2 is electrically connected to the corresponding power line Lv. Inother words, as shown in FIGS. 2 and 4, the holding capacitor Cs, inwhich the first interlayer insulation film IL1 serves as a capacitancefilm, is connected between the second source region S2 and the secondgate electrode G2 of the drive transistor T2. The second drain region D2is electrically connected to a second drain electrode Dp2 that goesthrough the first interlayer insulation film IL1. The second drainelectrode Dp2 and the upper electrode Cp2 are electrically connected bythe second interlayer insulation film IL2 deposited on the upper side ofthe first interlayer insulation film IL1.

When the data signal outputted from the data line drive circuit Dr1 isoutputted through the switching transistor T1 to the first drain regionD1, the holding capacitor Cs stores a charge relative to the outputteddata signal. Then, when the switching transistor T1 is switched off, adrive current relative to the charge stored in the holding capacitor Csis outputted through the drive transistor T2 (channel film B2) to thesecond drain region D2.

Next, the structure of the light emitting element formation regions 15will be described.

As shown in FIG. 2, a square light emitting element formation region 15is formed on the upper side of each of the pixels 13. As shown in FIG.5, an anode 20 is formed as a transparent electrode on the upper side ofthe second interlayer insulation film IL2 in the light emitting elementformation region 15.

The anode 20 is a transparent conductive film having opticaltransmissivity, such as an ITO film, one end of which goes through thesecond interlayer insulation film IL2 and is electrically connected tothe second drain region D2, as shown in FIG. 4. The top side 20 a ofthis anode 20 is made lyophilic to lower layer droplets 25D (see FIG. 9)by a lyophilic treatment (discussed below; step 12 in FIG. 6).

A third interlayer insulation film IL3, such as a silicon oxide filmthat insulates the anode 20 from other anodes 20, is deposited on theupper side of the anode 20. A square through-hole 21 made in theapproximate middle on the upper side of the anode 20 is formed in thisthird interlayer insulation film IL3, and a barrier layer 22 is formedon the upper side of this third interlayer insulation film IL3.

The barrier layer 22 is formed from what is called a positivephotosensitive material, which when exposed to exposure light Lpr (seeFIG. 7) of a specific wavelength, only the exposed portion becomessoluble in a developing solution such as an alkaline solution, and morespecifically is formed from a resin such as a photosensitive polyimidethat repels a lower layer formation solution 25L (see FIG. 9) and anupper layer formation solution 27L (see FIG. 10), which are discussedbelow.

A receptacle hole 23 that flares out upward is formed across from thethrough-hole 21. The receptacle hole 23 is formed large enough that thelower layer droplet 25D (see FIG. 9) and upper layer droplet 27D (seeFIG. 10), which are discussed below, can be accommodated in thecorresponding light emitting element formation region 15. A barrier 24that surrounds the light emitting element formation region 15 (the anode20 and the through-hole 21) is formed by the inner peripheral surface ofthis receptacle hole 23.

A lower thin film layer (hole transport layer) 25 is formed as a lowerlayer pattern on the upper side of the anode 20 within the lightemitting element formation region 15. The hole transport layer 25 is apattern composed of a hole transport layer formation material 25 s (seeFIG. 9) that constitutes a thin film layer formation material and apattern formation material.

The hole transport layer formation material 25 s in this embodiment is,for example, a benzidine derivative, styrylamine derivative,triphenylmethane derivative, triphenylamine derivative, hydrazonederivative, or other such low-molecular weight compound, or ahigh-molecular weight compound whose structure partly includes one ofthese, or polyaniline, polythiophene, polyvinylcarbazole,α-naphthylphenyldiamine, a mixture of poly(3,4-ethylenedioxythiophene)and polystyrenesulfonic acid (PEDOT/PSS) (Baytron P, trademark ofBayer), or another such high-molecular weight compound.

This hole transport layer 25 contains a surfactant 26. The surfactant 26has a lower layer functional group 26 a that is lyophilic (hydrophilicin this embodiment) with respect to the lower layer droplet 25Ddiscussed below, and an upper layer functional group 26 b that islyophilic (lipophilic in this embodiment) with respect to the upperlayer droplets 27D discussed below. The surfactant 26 is contained suchthat its lower layer functional groups 26 a are on the hole transportlayer 25 side, and its upper layer functional groups 26 b are exposed onthe top side of the hole transport layer 25.

The lower layer functional group 26 a enhances affinity with thehydrophilic lower layer solvent discussed below (or with the holetransport layer formation material 25 s). This affinity is the result ofthe formation of a bond, such as a hydrogen bond, a coordination bond,an ion bond, or a covalent bond, or of an affinity force such aselectrostatic attraction or van der Wall's force. Examples of the lowerlayer functional group 26 a include a hydroxyl group, oxalic acid group,ammonium group, sulfuric acid group, and phosphoric acid group, andsodium and potassium salts of these.

Meanwhile, the upper layer functional group 26 b enhances affinity withthe hydrophobic upper layer solvent discussed below (or with a lightemitting layer formation material 27 s). Examples of this upper layerfunctional group 26 b include a phenyl group, benzyl group, phenethylgroup, hydroxyphenyl group, chlorophenyl group, aminophenyl group,naphthyl group, anthrenyl group, pyrenyl group, thienyl group, pyrrolylgroup, cyclohexyl group, cyclohexenyl group, cyclopentyl group,cyclopentenyl group, pyridinyl group, and other such organic groupshaving a cyclic structure. Alternatively the upper layer functionalgroup 26 b may be a methyl group, ethyl group, propyl group, butylgroup, pentyl group, hexyl group, heptyl group, octyl group, nonylgroup, decyl group, tetradecyl group, hexadecyl group, octadecyl group,chloromethyl group, methoxyethyl group, hydroxyethyl group, aminoethylgroup, cyano group, mercaptopropyl group, vinyl group, allyl group,acryloxyethyl group, methacryloxyethyl group, glycidoxypropyl group,acetoxy group, or other such organic group, and may be any organic groupthat enhances affinity with the upper layer solvent (or with the lightemitting layer formation material 27 s).

An upper thin film layer (light emitting layer) 27 is laminated as anupper layer pattern on the upper side of the hole transport layer 25.The light emitting layer 27 is a pattern composed of the light emittinglayer formation material 27 s (see FIG. 10) that constitutes a thin filmlayer formation material and a pattern formation material.

The light emitting layer 27 in this embodiment is formed from a lightemitting layer formation material 27 s of the corresponding color (a redlight emitting layer formation material that emits red light, a greenlight emitting layer formation material that emits green light, or ablue light emitting layer formation material that emits blue light).Examples of the red light emitting layer formation material include ahigh-molecular weight compound having an alkyl or alkoxy substituent onthe benzene ring of a polyvinylenestyrene derivative, or ahigh-molecular weight compound having a cyano group on the vinylenegroup of a polyvinylenestyrene derivative. Examples of the green lightemitting layer formation material include a polyvinylenestyrenederivative in which an alkyl, alkoxy, or allyl derivative substituenthas been introduced into a benzene ring. Examples of the blue lightemitting layer formation material include a polyfluorene derivative(such as a copolymer of dialkylfluorene and anthracene, or a copolymerof dialkylfluorene and thiophene).

An organic electroluminescence layer (organic EL layer) 30 is formed asa laminated pattern by the hole transport layer 25 and the lightemitting layer 27.

A cathode 31 is formed as a back electrode composed of an opticallyreflective metal film, such as aluminum, on the upper side of thebarrier layer 22 (barrier 24) and the upper side of the organic EL layer30. The cathode 31 is formed so as to cover the entire surface of theelement formation surface 11 a, and supplies potential for all of thelight emitting element formation regions 15 shared by the pixels 13.

Specifically, an organic electroluminescence element (organic ELelement) is constituted as a light emitting element by the anode 20, theorganic EL layer 30, and the cathode 31.

When drive current corresponding to the data signal is supplied throughthe second drain region D2 to the anode 20, the organic EL layer 30emits light at a brightness corresponding to this drive current. Here,the light emitted from the organic EL layer 30 toward the cathode 31side (the upper side in FIG. 4) is reflected by the cathode 31.Accordingly, almost all of the light emitted from the organic EL layer30 is transmitted through the anode 20, the second interlayer insulationfilm IL2, the first interlayer insulation film IL1, the gate insulationfilm Gox, the element formation surface 11 a, and the transparentsubstrate 11, and is emitted outward from the back (the display side 11b) of the transparent substrate 11. Specifically, an image based on thedata signal is displayed on the display side 11 b of the organic ELdisplay 10.

An adhesive layer 32 composed of an epoxy resin or the like is formed onthe upper side of the cathode 31, and a sealing substrate 16 that coversthe element formation region 12 is applied via this adhesive layer 32.The sealing substrate 16 is a non-alkaline glass substrate, and servesto prevent the oxidation of the pixels 13, the wiring lines Lx, Ly, andLv, and so forth.

Method for Manufacturing Organic EL Display 10

Next, the method for manufacturing the organic EL display 10 will bedescribed. FIG. 6 is a flowchart illustrating the method formanufacturing the organic EL display 10, and FIGS. 7 to 10 are diagramsillustrating this method for manufacturing the organic EL display 10.

As shown in FIG. 6, first an organic EL layer preliminary step (stepS11) is performed, in which the wiring lines Lx, Ly, Lv, and Lvc and thetransistors T1 and T1 are formed on the element formation surface 11 aof the transparent substrate 11, and the barrier layer 22 is patterned.FIG. 7 is a diagram illustrating this organic EL layer preliminary step.

Specifically, in the organic EL layer preliminary step, first acrystallized polysilicon film is formed by excimer laser or the likeover the entire element formation surface 11 a, and this polysiliconfilm is patterned to form the channel films B1 and B2. Next, the gateinsulation film Gox composed of a silicon oxide film or the like isformed over the entire upper surface of the element formation surface 11a and the channel films B1 and B2, and a low-resistance metal film oftantalum or the like is deposited over the entire upper surface of thegate insulation film Gox. This low-resistance metal film is patterned toform the gate electrodes G1 and G2, the lower electrode Cp1 of theholding capacitor Cs, and the scanning line Lx.

When the gate electrodes G1 and G2 have been formed, an n-type impurityregion is formed in each of the channel films B1 and B2 by ion doping,using the gate electrodes G1 and G2 as masks. This forms the channelregions C1 and C2, the source regions S1 and S2, and the drain regionsD1 and D2. When the source regions S1 and S2 and the drain regions D1and D2 have been formed in the channel films B1 and B2, respectively,the first interlayer insulation film IL1 composed of a silicon oxidefilm or the like is deposited over the entire upper surface of the gateelectrodes G1 and G2, the scanning line Lx, and the gate insulation filmGox.

When the first interlayer insulation film IL1 has been formed, a pair ofcontact holes is patterned at positions relative to the source regionsS1 and S2 and the drain regions D1 and D2 in the first interlayerinsulation film IL1. Next, a metal film of aluminum or the like isdeposited over the entire upper surface of the first interlayerinsulation film IL1 and in these contact holes, and this metal film ispatterned to form the data line Ly and the upper electrode Cp2 of theholding capacitor Cs corresponding to each of the source regions S1 andS2. At the same time, the drain electrodes Dp1 and Dp2 corresponding tothe drain regions D1 and D2 are formed. The second interlayer insulationfilm IL2 composed of a silicon oxide film or the like is deposited overthe entire upper surface of the data line Ly, the upper electrode Cp2,the drain regions D1 and D2, and the first interlayer insulation filmIL1. This forms the switching transistor T1 and the drive transistor T2.

When the second interlayer insulation film IL2 has been deposited, a viahole is formed at a position across from the second drain region D2 inthis second interlayer insulation film IL2. Then, a transparentconductive film having optical transmissivity, such as an ITO film, isdeposited over the entire upper surface of the second interlayerinsulation film IL2 and in this via hole, and this transparentconductive film is patterned to form the anode 20 that connects to thesecond drain region D2. When the anode 20 has been formed, the thirdinterlayer insulation film IL3 composed of a silicon oxide film or thelike is formed over the entire upper surface of the second interlayerinsulation film IL2 and this anode 20.

When the third interlayer insulation film IL3 has been deposited, asshown in FIG. 7, the entire upper surface of the third interlayerinsulation film IL3 is coated with a photosensitive polyimide resin orthe like to form the barrier layer 22. Developing is then performed byexposing the barrier layer 22 at a position across from the anode 20 toexposure light Lpr of a specific wavelength through a mask Mk, whichresults in the patterning of the receptacle hole 23, whose innerperipheral surface is the barrier 24, in this barrier layer 22.

When the receptacle hole 23 has been patterned, the third interlayerinsulation film IL3 is patterned using the barrier layer 22 as a mask,and a through-hole 21 that communicates with the receptacle hole 23 isformed on the upper side of the anode 20.

This completes the organic EL layer preliminary step in which the wiringlines Lx, Ly, Lv, and Lvc and the transistors T1 and T2 are formed onthe element formation surface 11 a, and the receptacle hole 23 ispatterned.

As shown in FIG. 6, when the organic EL layer preliminary step iscomplete (step S11), a surface treatment step, in which the inside ofthe receptacle hole 23 and the surface of the barrier layer 22 aretreated, is performed in order to form the lower layer droplet 25D andthe upper layer droplet 27D discussed below (step S12). FIG. 8 is adiagram illustrating this surface treatment step.

Specifically, in the surface treatment step, first the entire elementformation surface 11 a is exposed to an oxygen-based plasma Ps toperform a hydrophilic treatment in which the third interlayer insulationfilm IL3 (through-hole 21) and the anode 20 (top side 20 a) in thereceptacle hole 23 are rendered hydrophilic. When this hydrophilictreatment has been performed, the entire element formation surface 11 ais exposed to a fluorine-based plasma Ps to perform a liquid repellencytreatment in which the barrier layer 22 (barrier 24) is once againrendered liquid repellent.

As shown in FIG. 6, when the surface treatment step is complete (stepS12), a lower layer formation step (step S13) is performed, in which alower layer droplet 25D containing the surfactant 26 and the holetransport layer formation material 25 s is formed inside the receptaclehole 23, and the hole transport layer 25 is formed. FIG. 9 is a diagramillustrating this lower layer formation step.

First, the structure of the droplet discharge apparatus used to form thelower layer droplet 25D will be described.

As shown in FIG. 9, a liquid discharge head 35 that constitutes thedroplet discharge apparatus in this embodiment is equipped with a nozzleplate 36. Numerous nozzles 36 n for discharging a liquid are formedfacing upward on the bottom side (the nozzle formation side 36 a) ofthis nozzle plate 36. A liquid supply chamber 37 that communicates witha liquid reservoir (not shown) and allows a liquid to be supplied to thenozzles 36 n is formed on the upper side of the nozzles 36 n. Adiaphragm 38 that vibrates reciprocally up and down and expands andcontracts the volume inside the liquid supply chamber 37 is provided onthe upper side of the liquid supply chamber 37. A piezoelectric element39 that vibrates the diaphragm 38 by expanding and contractingvertically is provided on the upper side of each diaphragm 38 at aposition across from the liquid supply chamber 37.

As shown in FIG. 9, a transparent substrate 11 conveyed to the dropletdischarge apparatus is positioned with its element formation surface 11a parallel to the nozzle formation side 36 a and with the center of thereceptacle holes 23 disposed directly under each of the nozzles 36 n.

Here, a lower layer formation solution 25L produced by dissolving thehole transport layer formation material 25 s in a lower layer solventand mixing the surfactant 26 into this solution is supplied into theliquid supply chamber 37.

The lower layer solvent in this embodiment is a hydrophilic liquid,whose main component includes water, ethanol, N-methylpyrrolidone,1,3-dimethyl-2-imidazolidinone or another such polar liquid.Accordingly, the surfactant 26 mixed into the lower layer formationsolution 25L is uniformly dissolved by the lower layer functional group26 a thereof, without clumping within the lower layer formation solution25L. In other words, the lower layer formation solution 25L is ahydrophilic solution in which the surfactant 26 has been uniformlymixed.

When a drive signal for forming the lower layer droplet 25D is inputtedto the liquid discharge head 35, the piezoelectric element 39 expands orcontracts according to this drive signal, thereby increasing ordecreasing the volume of the liquid supply chamber 37. If the volume ofthe 37 decreases here, the lower layer formation solution 25L isdischarged as a microscopic lower layer droplet 25 b from the nozzle 36n in an amount corresponding to the reduction in volume. The dischargedmicroscopic lower layer droplet 25 b lands on the top side of the anode20 in the receptacle hole 23. When the volume of the liquid supplychamber 37 then increases, the lower layer formation solution 25L issupplied from a liquid reservoir (not shown) into the liquid supplychamber 37 in an amount equal to the increase in volume. In other words,the liquid discharge head 35 discharges the required volume of lowerlayer formation solution 25L toward the receptacle hole 23 by means ofthe expansion and contraction of the liquid supply chamber 37. Here, theliquid discharge head 35 discharges the microscopic lower layer droplet25 b in an amount such that the hole transport layer formation material25 s contained in the lower layer droplet 25D will form a film of thedesired thickness.

The microscopic lower layer droplet 25 b discharged into the receptaclehole 23 uniformly wets and spreads out over the entire top side of theanode 20 and inside the through-hole 21 in an amount corresponding tohow much the above-mentioned hydrophilic treatment has been performed.After a while, the uniformly spread-out microscopic lower layer droplets25 b form the lower layer droplet 25D, which has a hemisphericalsurface, by means of the liquid repellency of the barrier 24 and its ownsurface tension, as shown by the two-dot chain line in FIG. 9.

When the lower layer droplet 25D has been formed, the transparentsubstrate 11 (the lower layer droplet 25D) is placed under a specificreduced pressure to evaporate the lower layer solvent of the lower layerdroplet 25D and solidify the hole transport layer formation material 25s in a state in which it uniformly contains the surfactant 26. Thesolidified hole transport layer formation material 25 s forms the holetransport layer 25 in a uniform shape, according to the amount ofuniform spreading over the entire top side of the anode 20.

The lower layer droplet 25D here is dried so that the upper layerfunctional groups 26 b, which are not lyophilic to the lower layersolvent, will be exposed on the surface of the surface of the lowerlayer droplet 25D. Accordingly, the hole transport layer 25 has thesurfactant 26 disposed such that the lower layer functional groups 26 aare inward, and the upper layer functional groups 26 b on exposed.

This forms the hole transport layer 25 containing the surfactant 26 overthe entire top side of the anode 20 in the through-hole 21 (thereceptacle hole 23).

As shown in FIG. 6, when the hole transport layer 25 has been formed(step S13), an upper layer formation step (step S14) is performed inwhich the upper layer droplet 27D containing a light emitting layerformation material of the corresponding color is formed in thereceptacle hole 23, and the light emitting layer 27 is formed. FIG. 10is a diagram illustrating the upper layer formation step.

In this upper layer formation step, just as in the lower layer formationstep, a microscopic upper layer droplet 27 b, composed of the upperlayer formation solution 27L obtained by dissolving a light emittinglayer formation material 27 s of one color in an upper layer solvent, isdischarged from a nozzle 36 n onto the corresponding hole transportlayer 25. The liquid discharge head 35 here discharges the microscopicupper layer droplet 27 b in an amount corresponding to the desired filmthickness in which the light emitting layer 27 is to be formed in thereceptacle hole 23.

The upper layer solvent in this embodiment is a hydrophobic liquid thatwill not dissolve the hole transport layer formation material 25 s. Themain component of this upper layer solvent is a non-polar liquid such asbenzene, toluene, xylene, cyclohexylbenzene, dihydrobenzofuran,trimethylbenzene, or tetramethylbenzene. In other words, the upper layerformation solution 27L is a hydrophobic solution that repulses the lowerlayer formation solution 25L.

The hydrophobic microscopic upper layer droplet 27 b discharged over thehole transport layer 25 uniformly wets and spreads out over the entiretop side of the hole transport layer 25 in an amount corresponding tohow much surfactant 26 is contained. After a while, the uniformlyspread-out hydrophobic microscopic upper layer droplet 27 b forms theupper layer droplet 27D, which has a hemispherical surface, by means ofthe liquid repellency of the barrier 24 and its own surface tension, asshown by the two-dot chain line in FIG. 10.

When the upper layer droplet 27D has been formed, just as in the lowerlayer formation step described above, the transparent substrate 11(upper layer droplet 27D) is placed under a specific reduced pressure toevaporate the upper layer solvent and solidify the light emitting layerformation material 27 s. The solidified light emitting layer formationmaterial 27 s forms the light emitting layer 27 in a uniform shape (suchas the film thickness distribution within the light emitting elementformation region 15 or the film thickness distribution between lightemitting element formation regions 15), according to the amount ofuniform wetting and spreading over the entire top side of the holetransport layer 25. Specifically, this forms the organic EL layer 30having a uniform shape.

As shown in FIG. 6, when the upper layer formation step is complete(step S14), an organic EL layer post-step (step S15) is performed, inwhich the cathode 31 is formed over the light emitting layer 27 (organicEL layer 30) and the barrier layer 22, and the pixel 13 is sealed.Specifically, the cathode 31 composed of a metal film such as aluminumis deposited over the entire top side of the organic EL layer 30 and thebarrier layer 22, forming an organic EL element composed of the anode20, the organic EL layer 30, and the cathode 31. When the organic ELelement has been formed, an adhesive layer 32 is formed by coating theentire top side of the cathode 31 (pixel 13) with an epoxy resin or thelike, and the sealing substrate 16 is applied to the transparentsubstrate 11 via this adhesive layer 32.

The result of the above is that an organic EL display 10 in which theorganic EL layer 30 has a uniform shape can be manufactured.

Next, the effects of this embodiment, constituted as above, will bedescribed.

(1) With the above embodiment, the lower layer formation solution 25Lwas produced by mixing the surfactant 26, which contained the lowerlayer functional group 26 a and the upper layer functional group 26 b,into the lower layer solvent, and the lower layer droplet 25D composedof this lower layer formation solution 25L was dried to form the holetransport layer 25. Therefore, the upper layer droplet 27D can wet andspread out over the entire top side of the hole transport layer 25 in anamount corresponding to how much surfactant 26 (upper layer functionalgroups 26 b) is contained.

(2) Furthermore, the lower layer functional groups 26 a allow thesurfactant 26 to be uniformly mixed into the lower layer formationsolution 25L, and allow the surfactant 26 to be contained uniformly inthe hole transport layer 25. As a result, damage to the hole transportlayer 25 by surface treatment with a plasma or the like can be avoided,and the shape of the light emitting layer 27 can be made uniform. Thisin turn allows the amount of surface treatment to which the holetransport layer 25 is subjected to be reduced, which affords a moreuniform shape of the organic EL layer 30 and increases the productivityof the organic EL display 10.

(3) With the above embodiment, just the top side of the hole transportlayer 25 was rendered hydrophilic by the surfactant 26 contained in thehole transport layer 25. Therefore, the surface state (liquidrepellency) of the barrier layer 22 and so forth can be maintainedbetter than when the entire surface is treated with a plasma or thelike. As a result, wetting of the discharged microscopic upper layerdroplets 27 b and so forth in the receptacle holes 23 can be avoided,making it possible to reliably form the light emitting layer 27 in anamount relative to the amount of this microscopic upper layer droplet 27b. This in turn affords a further increase in the shape uniformitybetween organic EL layers 30.

(4) With the above embodiment, the upper layer solvent of the upperlayer formation solution 27L was a hydrophobic (non-polar) liquid, andwas a liquid that did not dissolve the hole transport layer formationmaterial 25 s. Therefore, the upper layer droplet 27D can be formedwhile maintaining the shape of the hole transport layer 25. As a result,the shape of the light emitting layer 27, and in turn the shape of theorganic EL layer 30, can be made more uniform according to how well theuniformity of the hole transport layer 25 is maintained.

(5) With the above embodiment, the lower layer droplets 25D were formedby the microscopic lower layer droplets 25 b discharged from a dropletdischarge apparatus. Therefore, the desired volume of the surfactant 26can be reliably contained in the lower layer droplets 25D (holetransport layers 25), and the organic EL layers 30 can be formed moreuniformly than with other liquid phase processes (such as spin coating).

The above embodiment may be modified as follows.

Examples of the surfactant 26 in the above embodiment includepentaethylene glycol monobenzyl ether, 4-n-pentylcyclohexanoic acid,4-phenoxy-butyric acid, 2-phenoxyethanol, 1-phenoxy-2-propanol,2-phenoxypropanol, 2-phenoxypropionic acid, 3-phenoxypropionic acid,5-phenoxyvaleric acid, phenylaniline, phenylalaniol, 4-phenyl-1-butanol,4-phenyl-2-butanol, 3-phenoxy-1,2-propanediol, 2-phenylbutyricacid,4-phenylbutyricacid, 1,2-phenylenediacetic acid, 1,3-phenylenediaceticacid, N-phenyldiethanolamine, 2-phenyl ethyl alcohol,2-phenylethylamine, N-phenylethyleneamine, phenyl ethylene glycol,2-phenylglycine, N-phenylglycine, 2-phenyl glycol, 6-phenylhexanoicacid, 3-phenylacetic acid, 5-phenyl-1-pentanol, 5-phenylpentanoic acid,5-phenyl-4-pentyn-1-ol, 2-phenyl-1,3-propanediol, 3-phenyl-1-propanol,3-phenylpropionaldehyde, 2-phenylpropionic acid, 3-phenylpropylamine,4-(3-phenylpropyl)pyridine, 1-phenyl-1-propyn-3-ol, (phenylthio)aceticacid, 2-(phenylthio)ethanol, 5-phenylvaleric acid, 1-naphthyloxyaceticacid, 2-naphthyloxyacetic acid, 2-(1-naphthyl)ethanol,1-(1-naphthyl)ethanol, 1-(1-naphthyl)ethylamine,N-1-naphthylethylenediamine, 3-(2-naphthyl)alanine, 1-naphthalenic acid,2-naphthalenic acid, 1-naphthalenesulfonic acid, 2-naphthalenesulfonicacid, 2-naphthaleneacetic acid, 1-anthracenecarboxylic acid,2-anthracenecarboxylic acid, 3-anthracenecarboxylic acid,1-pyrenebutyric acid, 1-pyrenemethanol, 2-pyridinemethanol,3-pyridinemethanol, 4-pyridinemethanol, 2-pyridinepropanol,3-pyridinepropanol, 4-pyridinepropanol, 2-pyridineacetic acid,3-pyridineacetic acid, 4-pyridineacetic acid, 3-(3-pyridyl)acrylic acid,2-(2-pyridyl)ethanesulfonic acid, 2-(4-pyridyl)ethanesulfonic acid,(4-pyridylthio)acetic acid, thiophene-2-acetic acid, thiophene-3-aceticacid, 2-thiopheneacrylic acid, 2-thiophene ethanol, 3-thiophene ethanol,3-thiophene malonic acid, 2-thiophene methanol, 3-thiophene methanol,n-decyltrimethylammonium chloride, n-decyltrimethylammonium bromide,n-dodecyltrimethylammonium chloride, n-dodecyltrimethylammonium bromide,n-hexadecyltrimethylammonium chloride, n-hexadecyltrimethylammoniumbromide, n-octadecyltrimethylammonium chloride,n-octadecyltrimethylammonium bromide, di-n-dodecyldimethylammoniumchloride, di-n-dodecyldimethylammonium bromide, n-decylpyridiniumchloride, n-decylpyridinium bromide, n-dodecylpyridinium chloride,n-dodecylpyridinium bromide, n-dodecylpyridinium iodide,n-tetradecylpyridinium chloride, n-tetradecylpyridinium bromide,n-hexadecylpyridinium chloride, n-hexadecylpyridinium bromide,n-hexadecylpyridinium iodide, n-octadecylpyridinium chloride,n-octadecylpyridinium bromide, n-dodecylpicolinium chloride,n-dodecylpicolinium bromide, n-octadecylpicolinium chloride,n-octadecylpicolinium bromide, n-octadecylpicolinium iodide,N,N′-dimethyl-4,4′-bipyridinium dichloride,N,N′-dimethyl-4,4′-bipyridinium dibromide,N,N′-dimethyl-4,4′-bipyridinium bis(methylsulfate),N,N′-dimethyl-4,4′-bipyridinium bis(p-toluenesulfonate),N,N′-di(n-propyl)-4,4′-bipyridinium dichloride,N,N′-di(n-propyl)-4,4′-bipyridinium dibromide,N,N′-di(n-propyl)-4,4′-bipyridinium bis(p-toluenesulfonate),N,N′-dibenzyl-4,4′-bipyridinium dichloride,N,N′-dibenzyl-4,4′-bipyridinium dibromide,N,N′-dibenzyl-4,4′-bipyridinium diiodide,N,N′-dibenzyl-4,4′-bipyridinium bis(p-toluenesulfonate),N,N′-diphenyl-4,4′-bipyridinium dichloride,N,N′-diphenyl-4,4′-bipyridinium dibromide, N,N′-bis(3-sulfonatepropyl)-4,4′-bipyridinium, 1,3-bis{N-(N′-methyl-4,4′-bipyridyl)}propanetetrachloride, 1,3-bis{N-(N′-methyl-4,4′-bipyridyl)}propanetetrabromide, 1,3-bis{N-(N′-benzyl-4,4′-bipyridyl)}propanetetrachloride, 1,3-bis{N-(N′-benzyl-4,4′-bipyridyl)}propanetetrabromide, 1,4-bis{N-(N′-methyl-4,4′-bipyridyl)}butane tetrachloride,1,4-bis{N-(N′-methyl-4,4′-bipyridyl)}butane tetrabromide,1,4-bis{N-(N′-benzyl-4,4′-bipyridyl)}butane tetrachloride,1,4-bis{N-(N′-benzyl-4,4′-bipyridyl)}butane tetrabromide,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-o-xylene tetrachloride,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-o-xylene tetrabromide,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-o-xylene tetrachloride,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-o-xylene tetrabromide,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-m-xylene tetrachloride,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-m-xylene tetrabromide,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-m-xylene tetrachloride,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-m-xylene tetrabromide,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-p-xylene tetrachloride,α,α′-bis{N-(N′-methyl-4,4′-bipyridyl)}-p-xylene tetrabromide,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-p-xylene tetrachloride,α,α′-bis{N-(N′-benzyl-4,4′-bipyridyl)}-p-xylene tetrabromide,N-n-dodecyl-N′-methyl-4,4′-bipyridinium dichloride,N-n-dodecyl-N′-methyl-4,4′-bipyridinium bromide iodide,N-n-dodecyl-N′-methyl-4,4′-bipyridinium bromide methyl sulfate,N-n-dodecyl-N′-benzyl-4,4′-bipyridinium dichloride,N-n-dodecyl-N′-benzyl-4,4′-bipyridinium dibromide,N-n-dodecyl-N′-benzyl-4,4′-bipyridinium chloride bromide,N-n-hexadecyl-N′-methyl-4,4′-bipyridinium dichloride,N-n-hexadecyl-N′-methyl-4,4′-bipyridinium bromide iodide,N-n-hexadecyl-N′-methyl-4,4′-bipyridinium bromide methyl sulfate,N-n-hexadecyl-N′-benzyl-4,4′-bipyridinium dichloride,N-n-hexadecyl-N′-benzyl-4,4′-bipyridinium dibromide,N-n-octadecyl-N′-methyl-4,4′-bipyridinium dichloride,N-n-octadecyl-N′-methyl-4,4′-bipyridinium bromide iodide,N-n-octadecyl-N′-methyl-4,4′-bipyridinium bromide methyl sulfate,N-n-octadecyl-N′-benzyl-4,4′-bipyridinium dibromide,N,N′-di-n-dodecyl-4,4′-bipyridinium dichloride,N,N′-di-n-dodecyl-4,4′-bipyridinium dibromide,N,N′-di-n-hexadecyl-4,4′-bipyridinium dichloride,N,N′-di-n-hexadecyl-4,4′-bipyridinium dibromide,1,3-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}propane tetrachloride,1,3-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}propane tetrabromide,1,4-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}butane tetrabromide,1,6-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}hexane tetrabromide,1,3-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}propane tetrabromide,1,4-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}butane tetrabromide,1,6-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}hexane tetrabromide,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-o-xylene tetrachloride,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-o-xylene tetrabromide,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-m-xylene tetrachloride,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-m-xylene tetrabromide,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-p-xylene tetrachloride,α,α′-bis{N-(N′-n-dodecyl-4,4′-bipyridyl)}-p-xylene tetrabromide,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-o-xylene tetrachloride,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-o-xylene tetrabromide,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-m-xylene tetrachloride,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-m-xylene tetrabromide,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-p-xylene tetrachloride,α,α′-bis{N-(N′-n-hexadecyl-4,4′-bipyridyl)}-p-xylene tetrabromide,cyclohexyl acrylate, cyclohexyl methacrylate, cyclohexylacrylamide,cyclohexylmethacrylamide, N-cyclohexyl-N-methylacrylamide,N-cyclohexyl-N-methylmethacrylamide, cyclohexylmethyl acrylate,cyclohexylmethyl methacrylate, cyclohexylmethylacrylamide,cyclohexylmethylmethacrylamide, N-cyclohexylmethyl-N-methylacrylamide,N-cyclohexylmethyl-N-methylmethacrylamide, phenyl acrylate, phenylmethacrylate, phenyl acrylamide, phenylmethacrylamide,N-methyl-N-phenylacrylamide, N-methyl-N-phenylmethacrylamide, benzylacrylate, benzyl methacrylate, benzylacrylamide, benzylmethacrylamide,N-benzyl-N-methylacrylamide, N-benzyl-N-methylmethacrylamide, 1-norbomylacrylate, 1-norbomyl methacrylate, 1-norbomylacrylamide,1-norbomylmethacrylamide, N-methyl-N-(1-norbomyl)acrylamide,N-methyl-N-(1-norbornyl)methacrylamide, cyclooctyl acrylate, cyclooctylmethacrylate, cyclooctylacrylamide, cyclooctylmethacrylamide,N-cyclooctyl-N-methylacrylamide, N-cyclooctyl-N-methylmethacrylamide,adamantyl acrylate, adamantyl methacrylate, adamantylacrylamide,adamantylmethacrylamide, N-adamantyl-N-methylacrylamide,N-adamantyl-N-methylmethacrylamide, 1-naphthyl acrylate, 1-naphthylmethacrylate, 1-naphthylacrylamide, 1-naphthylmethacrylamide,N-methyl-N-(1-naphthyl)acrylamide,N-methyl-N-(1-naphthyl)methacrylamide, 2-naphthyl acrylate, 2-naphthylmethacrylate, 2-naphthylacrylamide, 2-naphthylmethacrylamide,N-methyl-N-(2-naphthyl)acrylamide,N-methyl-N-(2-naphthyl)methacrylamide, n-dodecyl acrylate, n-dodecylmethacrylate, n-dodecylacrylamide, n-dodecylmethacrylamide,N-n-dodecyl-N-methylacrylamide, N-n-dodecyl-N-methylmethacrylamide,cyclododecyl acrylate, cyclododecyl methacrylate,cyclododecylacrylamide, cyclododecylmethacrylamide,N-cyclododecyl-N-methylacrylamide,N-cyclododecyl-N-methylmethacrylamide, n-hexadecyl acrylate, n-hexadecylmethacrylate, n-hexadecylacrylamide, n-hexadecylmethacrylamide,N-n-hexadecyl-N-methylacrylamide, N-n-hexadecyl-N-methylmethacrylamide,n-octadecyl acrylate, n-octadecyl methacrylate, n-octadecylacrylamide,n-octadecylmethacrylamide, N-n-octadecyl-N-methylacrylamide,N-n-octadecyl-N-methylmethacrylamide, di-n-octylacrylamide,di-n-octylmethacrylamide, di-n-decylacrylamide,di-n-decylmethacrylamide, di-n-dodecylacrylamide,di-n-dodecylmethacrylamide, 9-anthracene methyl acrylate, 9-anthracenemethyl methacrylate, 9-anthracenemethylacrylamide,9-anthracenemethylmethacrylamide, 9-phenanthrene methyl acrylate,9-phenanthrene methyl methacrylate, 9-phenanthrenemethylacrylamide,9-phenanthrenemethylmethacrylamide,N-methyl-N-(9-phenanthrenemethyl)acrylamide,N-methyl-N-(9-phenanthrenemethyl)methacrylamide, 1-pyrene methylacrylate, 1-pyrene methyl methacrylate, 1-pyrenemethylacrylamide,1-pyrenemethylmethacrylamide, N-methyl-N-(1-pyrenemethyl)acrylamide,N-methyl-N-(1-pyrenemethyl)methacrylamide, and4-acryloyloxymethylphthalocyanine.

In the above embodiment, the surfactant 26 having the lower layerfunctional group 26 a and the upper layer functional group 26 b wasmixed into the lower layer formation solution 25L, but the invention isnot limited to this, and a silane coupling agent having the upper layerfunctional group 26 b may be mixed into the lower layer formationsolution 25L, so that a silane coupling agent or a hydrolyzate of suchsilane coupling agent is contained in the hole transport layer 25.Examples of this silane coupling agent include dimethyldimethoxysilane,diethyldiethoxysilane, 1-propenylmethyldichlorosilane,propyldimethylchlorosilane, propylmethyldichlorosilane,propyltrichlorosilane, propyltriethoxysilane, propyltrimethoxysilane,styrylethyltrimethoxysilane, tetradecyltrichlorosilane,3-thiocyanatopropyltriethoxysilane, p-tolyldimethylchlorosilane,p-tolylmethyldichlorosilane, p-tolyltrichlorosilane,p-tolyltrimethoxysilane, p-tolyltriethoxysilane,di-n-propyldi-n-propoxysilane, diisopropyldiisopropoxysilane,di-n-butyldi-n-butyloxysilane, di-sec-butyldi-sec-butyloxysilane,di-t-butyldi-t-butyloxysilane, octadecyltrichlorosilane,octadecylmethyldiethoxysilane, octadecyltriethoxysilane,octadecyltrimethoxysilane, octadecyldimethylchlorosilane,octadecylmethyldichlorosilane, octadecylmethoxydichlorosilane,7-octenyldimethylchlorosilane, 7-octenyltrichlorosilane,7-octenyltrimethoxysilane, octylmethyldichlorosilane,octyldimethylchlorosilane, octyltrichlorosilane,10-undecenyldimethylchlorosilane, undecyltrichlorosilane,vinyldimethylchlorosilane, methyloctadecyldimethoxysilane,methyldodecyldiethoxysilane, methyloctadecyldimethoxysilane,methyloctadecyldiethoxysilane, n-octylmethyldimethoxysilane,n-octylmethyldiethoxysilane, triacontyldimethylchlorosilane,triacontyltrichlorosilane, methyltrimethoxysilane,methyltriethoxysilane, methyltri-n-propoxysilane,methylisopropoxysilane, methyl-n-butyloxysilane,methyltri-sec-butyloxysilane, methyltri-t-butyloxysilane,ethyltrimethoxysilane, ethyltriethoxysilane, ethyltri-n-propoxysilane,ethylisopropoxysilane, ethyl-n-butyloxysilane,ethyltri-sec-butyloxysilane, ethyltri-t-butyloxysilane,n-propyltrimethoxysilane, isobutyltrimethoxysilane,n-hexyltrimethoxysilane, hexadecyltrimethoxysilane,n-octyltrimethoxysilane, n-dodecyltrimethoxysilane,n-octadecyltrimethoxysilane, n-propyltriethoxysilane,isobutyltriethoxysilane, n-hexyltriethoxysilane,hexadecyltriethoxysilane, n-octyltriethoxysilane,n-dodecyltrimethoxysilane, n-octadecyltriethoxysilane,2-[2-(trichlorosilyl)ethyl]pyridine,4-[2-(trichlorosilyl)ethyl]pyridine, diphenyldimethoxysilane,diphenyldiethoxysilane, 1,3-(trichlorosilylmethyl)heptacosane,dibenzyldimethoxysilane, dibenzyldiethoxysilane, phenyltrimethoxysilane,phenylmethyldimethoxysilane, phenyldimethylmethoxysilane,phenyldimethoxysilane, phenyldiethoxysilane, phenylmethyldiethoxysilane,phenyldimethylethoxysilane, benzyltriethoxysilane,benzyltrimethoxysilane, benzylmethyldimethoxysilane,benzyldimethylmethoxysilane, benzyldimethoxysilane,benzyldiethoxysilane, benzylmethyldiethoxysilane,benzyldimethylethoxysilane, benzyltriethoxysilane,dibenzyldimethoxysilane, dibenzyldiethoxysilane,3-acetoxypropyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane,allyltrimethoxysilane, allyltriethoxysilane,4-aminobutyltriethoxysilane,(aminoethylaminomethyl)phenethyltrimethoxysilane,N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane,N-(2-aminoethyl)-3-aminopropyltrimethoxysilane,6-(aminohexylaminopropyl)trimethoxysilane,p-aminophenyltrimethoxysilane, p-aminophenylethoxysilane,m-aminophenyltrimethoxysilane, m-aminophenylethoxysilane,3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane,ω-aminoundecyltrimethoxysilane, amyltriethoxysilane, benzooxasilepindimethyl ester, 5-(bicycloheptenyl)triethoxysilane,bis(2-hydroxyethyl)-3-aminopropyltriethoxysilane,8-bromooctyltrimethoxysilane, bromophenyltrimethoxysilane,3-bromopropyltrimethoxysilane, n-butyltrimethoxysilane,2-chloromethyltriethoxysilane, chloromethylmethyldiethoxysilane,chloromethylmethyldiisopropoxysilane,p-(chloromethyl)phneyltrimethoxysilane, chloromethyltriethoxysilane,chlorophenyltriethoxysilane, 3-chloropropylmethyldimethoxysilane,3-chloropropyltriethoxysilane, 3-chloropropyltrimethoxysilane,2-(4-chlorosulfonylphenyl)ethyltrimethoxysilane,2-cyanoethyltriethoxysilane, 2-cyanoethyltrimethoxysilane,cyanomethylphenethyltriethoxysilane, 3-cyanopropyltriethoxysilane,2-(3-cyclohexenyl)ethyltrimethoxysilane,2-(3-cyclohexenyl)ethyltriethoxysilane, 3-cyclohexenyl trichlorosilane,2-(3-cyclohexenyl)ethyltrichlorosilane,2-(3-cyclohexenyl)ethyldimethylchlorosilane,2-(3-cyclohexenyl)ethylmethyldichlorosilane,cyclohexyldimethylchlorosilane, cyclohexylethyldimethoxysilane,cyclohexylmethyldichlorosilane, cyclohexylmethyldimethoxysilane,(cyclohexylmethyl)trichlorosilane, cyclohexyltrichlorosilane,cyclohexyltrimethoxysilane, cyclooctyltrichlorosilane,(4-cyclooctenyl)trichlorosilane, cyclopentyltrichlorosilane,cyclopentyltrimethoxysilane, 1,1-diethoxy-1-silacyclopenta-3-ene,3-(2,4-dinitrophenylamino)propyltriethoxysilane,(dimethylchlorosilyl)methyl-7,7-dimethylnorpinane,(cyclohexylaminomethyl)methyldiethoxysilane,(3-cyclopentadienylpropyl)triethoxysilane,(N,N-diethyl-3-aminopropyl)trimethoxysilane,2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane,2-(3,4-epoxycyclohexyl)ethyltriethoxysilane,(furfuryloxymethyl)triethoxysilane,2-hydroxy-4-(3-triethoxypropoxy)diphenyl ketone,3-(p-methoxyphenyl)propylmethyldichlorosilane,3-(p-methoxyphenyl)propyltrichlorosilane,p-(methylphenethyl)methyldichlorosilane,p-(methylphenethyl)trichlorosilane,p-(methylphenethyl)dimethylchlorosilane,3-morpholinopropyltrimethoxysilane,(3-glycidoxypropyl)methyldiethoxysilane,3-glycidoxypropyltrimethoxysilane,1,2,3,4,7,7-hexachloro-6-methyldiethoxysilyl-2-norbornene,1,2,3,4,7,7-hexachloro-6-triethoxysilyl-2-norbornene,3-iodopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane,(mercaptomethyl)methyldiethoxysilane,3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyldimethoxysilane,3-mercaptopropyltriethoxysilane,3-methacryloxypropylmethyldiethoxysilane,3-methacryloxypropyltrimethoxysilane,methyl{2-(3-trimethoxysilylpropylamino)ethylamino}-3-propionate,7-octenyltrimethoxysilane, R-N-α-phenethyl-N′-triethoxysilylpropylurea,S-N-α-phenethyl-N′-triethoxysilylpropylurea, phenethyltrimethoxysilane,phenethylmethyldimethoxysilane, phenethyldimethylmethoxysilane,phenethyldimethoxysilane, phenethyldiethoxysilane,phenethylmethyldiethoxysilane, phenethyldimethylethoxysilane,phenethyltriethoxysilane, (3-phenylpropyl)dimethylchlorosilane,(3-phenylpropyl)methyldichlorosilane,N-phenylaminopropyltrimethoxysilane,N-(triethoxysilylpropyl)dansylamide,N-(3-triethoxysilylpropyl)-4,5-dihydroimidazole,2-(triethoxysilylethyl)-5-(chloroacetoxy)bicycloheptane,(S)-N-triethoxysilylpropyl-o-menthocarbamate,3-(triethoxysilylpropyl)-p-nitrobenzamide, 3-(triethoxysilyl)propylsuccinic anhydride,N-[5-(trimethoxysilyl)-2-aza-1-oxo-pentyl]caprolactam,2-(trimethoxysilylethyl)pyridine,N-(trimethoxysilylethyl)benzyl-N,N,N-trimethylammonium chloride,phenylvinyldiethoxysilane, 3-thiocyanatopropyltriethoxysilane,(tridecafluoro-1,1,2,2-tetrahydrooctyl)triethoxysilane,N-{3-(triethoxysilyl)propyl}phthalamic acid,(3,3,3-trifluoropropyl)methyldimethoxysilane,(3,3,3-trifluoropropyl)trimethoxysilane,1-trimethoxysilyl-2-(chloromethyl)phenylethane,2-(trimethoxysilyl)ethylphenylsulfonyl azide,β-trimethoxysilylethyl-2-pyridine,trimethoxysilylpropyldiethylenetriamine,N-(3-trimethoxysilylpropyl)pyrrole,N-trimethoxysilylpropyl-N,N,N-tributylammonium bromide,N-trimethoxysilylpropyl-N,N,N-tributylammonium chloride,N-trimethoxysilylpropyl-N,N,N-trimethylammonium chloride,vinylmethyldiethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane,vinylmethyldimethoxysilane, vinyldimethylmethoxysilane,vinyldimethylethoxysilane, vinylmethyldichlorosilane,vinylphenyldichlorosilane, vinylphenyldiethoxysilane,vinylphenyldimethylsilane, vinylphenylmethylchlorosilane,vinyltriphenoxysilane, vinyltris-t-butoxysilane,adamantylethyltrichlorosilane, allylphenyltrichlorosilane,(aminoethylaminomethyl)phenethyltrimethoxysilane,3-aminophenoxydimethylvinylsilane, phenyltrichlorosilane,phenyldimethylchlorosilane, phenylmethyldichlorosilane,benzyltrichlorosilane, benzyldimethylchlorosilane,benzylmethyldichlorosilane, phenethyldiisopropylchlorosilane,phenethyltrichlorosilane, phenethyldimethylchlorosilane,phenethylmethyldichlorosilane, 5-(bicycloheptenyl)trichlorosilane,5-(bicycloheptenyl)triethoxysilane,2-(bicycloheptyl)dimethylchlorosilane, 2-(bicycloheptyl)trichlorosilane,1,4-bis(trimethoxysilylethyl)benzene, bromophenyltrichlorosilane,3-phenoxypropyldimethylchlorosilane, 3-phenoxypropyltrichlorosilane,t-butylphenylchlorosilane, t-butylphenylchlorosilane,t-butylphenylmethoxysilane,, t-butylphenyldichlorosilane,p-(t-butyl)phenethyldimethylchlorosilane,p-(t-butyl)phenethyltrichlorosilane,1,3-(chlorodimethylsilylmethyl)heptacosane,((chloromethyl)phenylethyl)dimethylchlorosilane,((chloromethyl)phenylethyl) methyldichlorosilane,((chloromethyl)phenylethyl)trichlorosilane,((chloromethyl)phenylethyl)trimethoxysilane,chlorophenyltrichlorosilane, 2-cyanoethyltrichlorosilane,2-cyanoethylmethyldichlorosilane, 3-cyanopropylmethyldiethoxysilane,3-cyanopropylmethyldichlorosilane, 3-cyanopropyldimethylchlorosilane,3-cyanopropyldimethylethoxysilane, 3-cyanopropylmethyldichlorosilane,and 3-cyanopropyltrichlorosilane.

With the above embodiment, the lower layer formation solution 25L andthe upper layer formation solution 27L were formed by dissolving thehole transport layer formation material 25 s and the light emittinglayer formation material 27 s in the lower layer solvent and the upperlayer solvent, respectively, but the invention is not limited to this,and the hole transport layer formation material 25 s and the lightemitting layer formation material 27 s may be dispersed in correspondingdispersion media, and these dispersion used as the lower layer formationsolution 25L and the upper layer formation solution 27L, respectively.

With the above embodiment, the hole transport layer 25 of the organic ELdisplay 10 contained the surfactant 26, but the invention is not limitedto this, and may be constituted such that when the light emitting layer27 is formed in the step of manufacturing the organic EL display 10, thehole transport layer 25 contains the surfactant 26 that is lyophilicwith respect to the upper layer droplets 27D. Specifically, thesurfactant 26 need only exhibit the property of enhancing wettabilitywhen the upper layer droplets 27D are formed, and need not manifest itssurfactant capability when the hole transport layer 25 is formed, orafter the light emitting layer 27 has been formed.

With the above embodiment, the laminated pattern was embodied as twolayers, namely, the hole transport layer 25 and the light emitting layer27, but is not limited to this, and may include a multiphoton structurein which these two layers are repeatedly laminated, or a plurality ofthin film layers may be laminated, for example.

With the above embodiment, the organic EL display 10 was embodied as abottom emission type, but is not limited to this, and may involve a topemission type instead. Alternatively, the light emitting layer 27 may beconstituted as a lower thin film layer, and the surfactant 26 may becontained in this light emitting layer 27.

With the above embodiment, the hole transport layer formation material25 s and the light emitting layer formation material 27 s were embodiedas high-molecular weight organic materials, but are not limited to this,and conventional low-molecular weight materials may be used instead.

With the above embodiment, the organic EL layer 30 was constituted bythe hole transport layer 25 and the light emitting layer 27, but theconstitution may instead be such that an electron injection layercomposed of laminated films of calcium and lithium fluoride, forexample, is provided to the upper layer of this light emitting layer 27.Also, the electron injection layer here may be formed by droplets, and asurfactant contained in the light emitting layer 27.

With the above embodiment, the control element formation region 14 wasequipped with the switching transistor T1 and the drive transistor T2,but is not limited to this, and the constitution may instead be suchthat a single transistor, or numerous transistors, or numerouscapacitors are used, according to the desired element design.

With the above embodiment, the organic EL layer 30 was formed by aninkjet method, but the invention is not limited to this, and the methodfor forming the organic EL layer 30 may instead be such that, forexample, the lower layer droplets 25D and the upper layer droplets 27Dare formed by a liquid applied by spin coating or another such method,and the organic EL layer 30 is formed by drying and solidifying thisliquid.

With the above embodiment, the microscopic lower layer droplets 25 bwere discharged by the piezoelectric elements 39, but the invention isnot limited to this, and a resistance heating element may be provided tothe liquid supply chamber 37, for example, and the microscopic lowerlayer droplets 25 b may be discharged by bursting the bubbles formed bythe heating of this resistance heating element.

With the above embodiment, the laminated pattern was embodied as theorganic EL layer 30, but is not limited to this, and may instead becolor filters of various colors, and may also be any of various wiringpatterns of the scanning lines Lx or the data lines Ly, for example.

With the above embodiment, the electro-optical device was embodied asthe organic EL display 10, but is not limited to this, and may insteadbe a backlight mounted in a liquid crystal panel, for example, or may bea field effect type of display (FED, SED, etc.) that is equipped with aflat electron emission element, and that utilizes the ability of afluorescent substance to emit light as a result of the electrons emittedfrom this element.

This application claims priority to Japanese Patent Application No.2004-362541. The entire disclosure of Japanese Patent Application No.2004-362541 is hereby incorporated herein by reference.

1. A patterned substrate, comprising an element formation surface; alaminated pattern having laminating patterns formed on the elementformation surface by drying droplets containing a pattern formationmaterial, wherein a lower layer pattern contains a surfactant that islyophilic with respect to droplets that form an upper layer pattern. 2.The patterned substrate according to claim 1, wherein the surfactanthas: a functional group that is lyophilic with respect to the dropletsthat form the upper layer pattern; and a functional group that islyophilic with respect to droplets that form the lower layer pattern. 3.The patterned substrate according to claim 1, wherein the surfactant isan organic compound having a hydrophilic functional group and alipophilic functional group.
 4. The patterned substrate according toclaim 1, wherein the surfactant is either a silane coupling agent havinga functional group that is lyophilic with respect to the droplets thatform the upper layer pattern, or a hydrolyzate of the silane couplingagent.
 5. The patterned substrate according to claim 1, wherein thepattern formation material is a light emitting element formationmaterial, and the laminated pattern is a light emitting element.
 6. Anelectro-optical device comprising a light emitting element havinglaminated thin film layers formed by drying droplets containing a thinfilm layer formation material, wherein a lower thin film layer containsa surfactant that is lyophilic with respect to droplets that form anupper thin film layer.
 7. The electro-optical device according to claim6, wherein the surfactant has: a functional group that is lyophilic withrespect to the droplets that form the upper thin film layer; and afunctional group that is lyophilic with respect to droplets that formthe lower thin film layer.
 8. The electro-optical device according toclaim 6, wherein the surfactant is an organic compound having ahydrophilic functional group and a lipophilic functional group.
 9. Theelectro-optical device according to claim 6, wherein the surfactant iseither a silane coupling agent having a functional group that islyophilic with respect to the droplets that form the upper layer, or ahydrolyzate of the silane coupling agent.
 10. The electro-optical deviceaccording to claim 6, wherein the light emitting element is anelectroluminescence element having the laminated thin film layersbetween a transparent electrode and a back electrode.
 11. Theelectro-optical device according to claim 10, wherein the upper thinfilm layer is a light emitting layer formed of a light emitting layerformation material that can be dissolved or dispersed in a hydrophobicliquid, and the lower thin film layer is a hole transport layer formedof a hole transport layer formation material that can be dissolved ordispersed in a hydrophilic liquid.
 12. A method for manufacturing anelectro-optical device, in which thin film layers are formed by dryingdroplets containing a thin film layer formation material, and these thinfilm layers are laminated to form a light emitting element, the methodcomprising mixing a surfactant that is lyophilic with respect thedroplets that form an upper thin film layer into droplets that form alower thin film layer; and drying the droplets in which this surfactanthas been mixed to form the lower thin film layer, and then drying thedroplets that form the upper thin film layer on the lower thin filmlayer to laminate the upper thin film layer over the lower thin filmlayer.
 13. The method for manufacturing an electro-optical deviceaccording to claim 12, wherein the surfactant has: a functional groupthat is lyophilic with respect to the droplets that form the upperlayer; and a functional group that is lyophilic with respect to thedroplets that form the lower layer.
 14. The method for manufacturing anelectro-optical device according to claim 12, wherein the surfactant isan organic compound having a hydrophilic functional group and alipophilic functional group.
 15. The method for manufacturing anelectro-optical device according to claim 12, wherein the surfactant iseither a silane coupling agent including a functional group that islyophilic with respect to the droplets that form the upper thin filmlayer.
 16. The method for manufacturing an electro-optical deviceaccording to claim 12, wherein the light emitting element is anelectroluminescence element formed by laminating the thin film layersbetween a transparent electrode and a back electrode.
 17. The method formanufacturing an electro-optical device according to claim 16, whereinthe surfactant is mixed into a hydrophilic liquid containing a holetransport layer formation material, and the droplets composed of theliquid in which the surfactant has been mixed are dried to form a holetransport layer which is the lower thin film layer, after which ahydrophobic liquid containing a light emitting layer formation materialis dried over the hole transport layer to laminate a light emittinglayer which is the upper thin film layer.
 18. The method formanufacturing an electro-optical device according to claim 17, wherein amain component of the hydrophilic liquid is a polar liquid, and a maincomponent of the hydrophobic liquid is a non-polar liquid.
 19. Themethod for manufacturing an electro-optical device according to claim12, wherein the droplets are discharged from a droplet dischargeapparatus.